Title of Invention

"A PROCESS FOR THE PREPARATION OF CHIRAL POLYMER METERIAL"

Abstract The present relates to a chiral polymer material for EM wave attenuation and the process for the preparation thereof. A chiral polymer material is obtained, by copolymerizing synthesized chiral monomer with a vinyl monomer in an organic solvent. The chiral monomer is obtained by condensation reaction of an ethylenically unsaturated acid chloride with a chiral amine compound in presence of an alkali. The chiral monomer and the vinyl monomer are co-polymerized by free radical polymerization process using a thermal radical initiator in an inert atmosphere.
Full Text


We claim:
1. A process for the preparation of a chiral polymer material, comprising the following steps: a) condensing an ethylenically unsaturated acid chloride of the formula:
with a chiral amine compound of the formula :

(Formula Removed)
Wherein R= H, CH3) C2H5
R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2
in presence of an alkali;
b) pouring the reaction mixture of step (a) in distilled water and recrystallizing the reaction mixture to obtain the colourless crystal of chiral monomer of the formula
(Formula Removed)
Wherein R= H, CH3, C2H5
R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2;
c) copolymerizing the chiral monomer obtained in step (b) with a vinyl monomer in an organic
solvent, wherein the vinyl monomer is selected from methyl methacrylate, ethyl methacrylate,
2-hydroxy ethyl methacrylate, ethyl acrylate, 2-hydroxy ethyl acrylate and butyl acrylate, in 1:
0.5-1: 8.8 mole ratio preferably 1:1 mole ratio in a hydrocarbon solvent by free radical
polymerization process using a thermal radical initiator at 60-100° C in an inert atmosphere
preferably nitrogen; and
d) precipitating the reaction mixture obtained from step (c) in a non- solvent to obtain the
chiral polymer material.
2. The process as claimed in claim 1 wherein the chiral polymer material is obtained in a form
of white powder.
3. The process as claimed in claim 1 wherein the chiral copolymer material exhibit preferably
optical rotation of +92° at 589 nm wave length.
4. The process as claimed in claim 1 wherein, the hydrocarbon solvent is selected from group
consisting of xylene, toluene and heptane.
5. The process as claimed in claim 1 wherein, said alkali is an alkali metal hydroxide or triethyl amine.
6. The process as claimed in claim 1 wherein, said thermal radical initiator is selected
from group consisting of benzoyl peroxide (BPO), tertiary- butyl hydroperoxide and 2, 2'-azo-bis- isobutyronitrile (AIBN).
7. A chiral polymer material for EM wave attenuation obtained by polymerizing synthesized chiral monomer as claimed in claim 1 having the formula-
(Formula Removed)
Wherein R= H, CH3, C2H5
R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2; with a vinyl monomer in an organic solvent, wherein the vinyl monomer is selected from methyl methacrylate, ethyl methacrylate, 2-hydroxy ethyl methacrylate, ethyl acrylate, 2-hydroxy ethyl acrylate and butyl acrylate.

Documents:

1265-DEL-2005-Abstract-(07-07-2011).pdf

1265-DEL-2005-Claims-(07-07-2011).pdf

1265-del-2005-Claims-(20-04-2011).pdf

1265-DEL-2005-Correspondence Others-(07-07-2011).pdf

1265-del-2005-Correspondence-Others-(20-04-2011).pdf

1265-DEL-2005-Form-1-(07-07-2011).pdf

1265-DEL-2005-Form-2-(07-07-2011).pdf

1265-DEL-2005-GPA-(07-07-2011).pdf


Patent Number 249885
Indian Patent Application Number 1265/DEL/2005
PG Journal Number 47/2011
Publication Date 25-Nov-2011
Grant Date 21-Nov-2011
Date of Filing 17-May-2005
Name of Patentee DIRECTOR GENERAL, DEFENCE RESEARCH & DEVELOPMENT ORGANIZATION (DRDO)
Applicant Address MINISTRY OF DEFENCE, GOVT. OF INDIA, WEST BLOCK-VIII, WING 1, SECTOR-1,R.K.PURAM, NEW DELHI-110066, INDIA.
Inventors:
# Inventor's Name Inventor's Address
1 BAG DIBYENDU SEKHAR DEFENCE MATERIALS AND STORES RESEARCH AND DEVELOPMENT ESTABLISHMENT G.T.ROAD, KANPUR-208 013, UTTAR PRADESH, INDIA.
2 LAL DHANNU DEFENCE MATERIALS AND STORES RESEARCH AND DEVELOPMENT ESTABLISHMENT, G.T. ROAD, KANPUR-208013, UTTAR PRADESH, INDIA
3 MATHUR GYANESH NARAYAN DEFENCE MATERIALS AND STORES RESEARCH AND DEVELOPMENT ESTABLISHMENT, G.T. ROAD, KANPUR-208013, UTTAR PRADESH, INDIA
PCT International Classification Number C08F2/00
PCT International Application Number N/A
PCT International Filing date
PCT Conventions:
# PCT Application Number Date of Convention Priority Country
1 NA