Title of Invention

A PROCESS FOR PRODUCING ETOPOSIDE OR DERIVATIVE THEREOF

Abstract A protected 4'-demethyl-4-epipodophyllotoxin is reacted with a protected glucose derivative in 7-fold parts by volume of the glucose derivative based on 1 part by weight of the protected 4'-demethyl-4-epipodo- phyllotoxin in a non-halogen type organic solvent to give an etoposide derivative of formula (3) which is protected at its functional groups; wherein each of R1 and R2 each is a protective group for hydroxy, if necessary, followed by removal of these protective groups. By use of the non-halogen type organic solvent in lieu of any harmful halogen type solvent, formation of undesirable by-products can be minimized so that the etoposides can be obtained in a high yield and high purity.
Full Text BACKGROUND OF THE INVENTION
Field of the Invention
The present invention relates to a process for
producing 4'-demethyl-4-epipodophyllotoxin-ß-D-ethyl-
ideneglucoside (hereinafter referred to as etoposide),
which has been widely used as an anticancer agent, and a
derivative thereof wherein the functional group(s) of
etoposide are proctected.
Related Art Statement
EP 0394908A1 and EP 0162701B1 disclose a
process for producing etoposide with protected
functional group(s) of formula (3)
wherein each of R1 and R2 is a protective group for
hydroxy, which comprises reacting a protected 4'-
demethyl-4-epipodophyllotoxin of formula (1)
wherein R1 is as defined above, with a protected glucose
derivatives of formula (2)
wherein R2 is as defined above, in the presence of a
boron trifluoride dialkyl ether complex as a catalyst.
In the reaction, a halogen type solvent such as
dichloromethane or chloroform is employed as a
preferable solvent for the reaction. EP 0394907A1
discloses that the reaction may also be carried out in a
solvent other than dichloromethane, for example, ethyl
acetate, ether, acetone, acetonitrile or the like.
However, only dichloroethane is employed at working
examples in EP 0394907A1.
In recent years, it has been usually desired
to use in a chemical reaction non-halogen type solvents
in place of halogen type ones due to the risk of causing
cancer in human and adverse affect against environment.
Despite such a desire, any known reactions for producing
etoposide or derivative tntreof do not actually use non-
halogen type solvents in the reaction, since the
the reaction is inactivated, the starting compound or
reaction product is adversely affected by non-halogen
type solvents and these solvents have a poor solubility.
In addition, the present inventors investigations
reveal that when the reaction is carried out in a non-
halogen type solvent at the same amount as that of a
halogen type solvent conventionally used, a dimer of the
protected 4'-demethyl-4-epipodophyllotoxin of formula
(1) and a-glucoside of the etoposide of formula (3) are
by-produced in extremely large quantities, together with
the desired ß-glucoside of the etoposide of formula (3).
The by-produced dimer and the a-glucoside reduce the
yield of the desired product as well as the quality of
the produced etoposides. It is thus desired to minimize
the formation of these by-products as less as possible.
SUMMARY OF THE INVENTION
The present inventors have extensively
investigated the reaction under various conditions in a
non-halogen type solvent instead of a conventional
halogen type solvent. As a result, it has been found
that when an amount of the non-halogen type solvent,
especially an amount of non-halogen type aliphatic solvent
is reduced to not more than the half of an amount of halogen
type solvent conventionally used for the reaction,
formation of the dimer of protected 4'-demethyl-4-
epipodophyllotoxin can be markedly prevented. It has
also been found that when a non-halogen type aliphatic
solvent and a non-halogen type aromatic solvent are
employed in the reaction as a solvent mixture, the
mixture is excellent as a reaction solvent for prevent-
ing the formation of the dimer. It has further been
found that the co-presence of an ether in the reaction
system can markedly prevent formation of the undesired
a-glucoside. The present invention has come to be
accomplished based on these findings.
That is, a first aspect of the present inven-
tion is to provide a process for producing an etoposide
tected 4'-demethyl-4-epipodophyllotoxin of formula (1):
wherein R1 is a protective group for hydroxy, with a
protected glucose derivative of formula (2):
wherein R2 is a protective group for hydroxy in a non-
halogen type organic solvent, in the presence of a non-
halogen type aliphatic solvent in a 0.1 to 7-fold part
by volume based on 1 part by weight of the etoposide
derivative of formula (1), and a dehydration condensing
catalyst, to obtain a protected etoposide of formula
(3):
wherein R1 and R2 are as defined above, and optionally
removing the protective group(s) from the protected
etoposide.
A second aspect of the present invention is to
provide a process for producing an etoposide or
derivative thereof, wherein an ether is co-present in
the reaction system.
A third aspect of the present invention is to
provide a process for producing an etoposide or
derivative thereof, wherein a boron trifluoride di-lower
alkyl ether complex or a tri(C1-C4 alkyl)silyltrifluoro-
methanesulfonate is employed as a catalyst.
A fourth aspect of the present invention is to
provide a process for producing an etoposide or deriva-
tive thereof, wherein the other is a mono or polyetmer
containing 1 to 5 ether groups and 2 to 6 linear or
cyclic hydrocarbon groups having 1 to 6 carbon atoms.
A fifth aspect of the present invention is to
provide a process for producing an etoposide or
derivative thereof, wherein the mono or polyether is
represented by formula (4):
R3 - O - (R4 - O)n - R5 (4)
wherein n is an integer of 0 to 4; each of R3 and R5
independently is an alkyl group having 1 to 4 carbon
atoms; and R4 is a linear or branched alkylene group
having 2 to 4 carbon atoms,
A sixth aspect of the present invention is to
provide a process for producing an etoposide or
derivative thereof, wherein as the non-halogen type
solvent, acetonitrile alone or a solvent mixture of
acetonitrile and an aromatic solvent is employed.
A seventh aspect of the present invention is
to provide a process for producing an etoposide or
derivative thereof which comprises reacting a protected
4'-demethyl-4-epipodophyllotoxin of (1);
wherein R1 is a protective group for hydroxy, with a
protected glucose derivative of formula (2);
wherein R2 is a protective group for hydroxy, in a
solvent mixture of a non-halogen type aliphatic solvent
and a non-halogen type aromatic solvent in the presence
of a dehydration condensing catalyst, to obtain a
protected etoposide of formula (3);
wherein R1 and R2 are as defined above or hydrogen atom,
and optionally removing the protective group(s) from the
protected etoposide.
An eighth aspect of the present invention is
to provide a process for producing an etoposide or
derivative thereof, wherein the non-halogen type
aliphatic solvent is selected from the group consisting
of a nitrile compound, a ketone compound and an ester
compound.
A ninth aspect of the present invention is to
provide a process for producing an etoposide or deriva-
tive thereof, wherein used is as the non-halogen type
aliphatic solvent: a nitrile compound of which aliphatic
hydrocarbon group is selected from the group consisting
of an alkyl group having 1 to 3 carbon atoms and an
compound of which aliphatic hydrocarbon groups at the
both sides therein are selected from the group consist-
ing of an alkyl group having 1 to 5 carbon atoms and an
alkylene group having 1 to 5 carbon atoms; and an ester
compound which is an ester of acetic acid or propionic
acid and an alcohol having 1 to 4 carbon atoms.
A tenth aspect of the present invention is to
provide a process for producing an etoposide or deriva-
tive thereof, wherein the non-halogen type aromatic
solvent is benzene or a benzene substituted with 1 to 3
substituents selected from the group consisting of an
alkyl group having 1 to 4 carbon atoms and nitro.
An eleventh aspect of the present invention is
to provide a process for producing an etoposide or
derivative thereof, wherein an amount of the non-halogen
type aliphatic solvent used is in the range of 0.1 to 4-
fold parts by volume based on 1 part by weight of the
compound of formula (1) and the total amount of the
solvent mixture is in the range of 1 to 10-fold parts by
volume based on 1 part by weight of the compound of
formula (1).
A twelfth aspect of the present invention is
to provide a process for producing an etoposide or
derivative thereof, wherein the non-halogen type
aliphatic solvent is selected from the group consisting
of acetonitrile, propionitrile, acetone, methyl ethyl
ketone, methyl isobutyl ketone, ethyl acetate and
isopropyl acetate; the non-halogen type aromatic solvent
is selected from the group consisting of benzene,
toluene, xylene, ethylbenzene, nitrobenzene and nitro-
toluene and the dehydration condensing catalyst is a
boron trifiuoride di-alkyl ether having 1 to 4 carbon
atoms arid? is employed in an amount ranging from 1 to
15 equivalents to the 4'-demethyl-4-etoposide of
formula (1).
A thirteenth aspect of the present invention
is to provide a process for producing an etoposide or
derivative thereof, wherein the non-halogen type
aliphatic solvent is a solvent mixture of acetonitrile
and benzene, toluene or xylene, an amount of aceto-
nitrile used being in the range of 0.3 to 3 parts by
volume based on 1 part by weight of the compound of
formula (1), a total amount of the solvent mixture being
in the range of 2 to 6 parts by volume based on 1 part
by weight of the compound of formula (1), and an amount
of the boron trifluoride di-alkyl ether having 1 to 4
carbon atoms used as a catalyst is in the range of 1 to
6 equivalents to the compound of formula (1).
A fourteenth aspect of the present invention
is to provide a process for producing an etoposide or
derivative thereof which comprises reacting a protected
4'-demethyl-4-epipodophyllotoxin of formula (I) with a
protected glucose derivative of formula (2) in a non-
halogen type aliphatic solvent in the presence of a
dehydration condensing catalyst to obtain a protected
etoposide of formula (3), and optionally removing the
protective group(s) from the protected etoposide,
wherein the non-halogen type aliphatic solvent is a
nitrile compound at an amount in the range of 1 to 10-
fold parts by volume based on 1 part by weight of the
compound of formula (1).
A fifteenth aspect of the present invention is
to provide an etoposide, which contains not greater than
50 ppb halogen compounds.
A sixteenth aspect of the present invention is
to provide an etoposide, which is substantially free of
a dimer of 4'-demethyl-4-epipodophyllotoxin.
A seventeenth aspect of the present invention
is to provide an etoposide, which is substantially free
of etoposide in the a-glucoside form.
DESCRIPTION OP THE PREFERRED EMBODIMENTS
Representative examples of the protective
group R1 for hydroxy in the protected 4'-demethyl-4-
epipodophyllotoxin of formula (1) include a lower
alkylcarbonyl group, a lower alkyloxycarbonyl group,
benzoyl, benzyloxycarbonyl, a lower alkylcarbonyl group
substituted with 1 to 3 halogen atoms, a lower alkyloxy-
carbonyl group substituted with 1 to 3 halogen atoms, a
benzoyl group substituted with 1 to 3 halogen atoms, and
a benzyloxycarbonyl group substituted with 1 to 3
halogen atoms. Of these protective groups, an acetyl or
an acetyl group substituted with 1 to 3 halogen atoms is
preferred, wherein specific examples of the halogen atom
are fluorine, chlorine and bromine. Monochloroacetyl
and dichloroacetyl are particularly preferred as the
protective group.
Representative examples of the protective
group R2 for hydroxy in the protected glucose derivative
of formula (2) include a lower alkylcarbonyl group,
benzoyl, a lower alkyloxycarbonyl group substituted with
1 to 3 halogen atoms, a lower alkylcarbonyl group
substituted with 1 to 3 halogen atoms, a benzoyl group
substituted with 1 to 3 halogen atoms, and a lower
alkyloxycarbonyl group substituted with 1 to 3 halogen
atoms. Of these protective groups, an acetyl or an
acetyl group substituted with 1 to 3 halogen atoms is
preferred, wherein specific examples of the halogen atom
are fluorine, chlorine and bromine. Monochloroacetyl
and dichloroacetyl are particularly preferred as the
protective group.
Solvent, a non-halogen type organic
solvent is employed in the reaction described above.
nitrite compounds are acetinitrile, propionitrile,
butyronitrile and acrylonitrile. As the ketone com-
pound, employed may be those having aliphatic hydro-
carbon groups at the both sides of the ketone compound
which contains an alkyl or alkylene moiety having 1 to 5
carbon atoms. Specific examples of the ketone compound
include acetone, methyl ethyl ketone, methyl propyl
ketone (2-pentanone), 3-pentanone, methyl isobutyl
ketone (2-hexanone), 3-hexanone, methyl vinyl ketone and
ethyl vinyl ketone and the like. As the ester compound,
any ester compound may be employed without any particu-
lar limitation, so long as it can be used as a solvent.
Preferred are esters of acetic acid or propionic acid
and an alcohol having 1 to 4 carbon atoms. Specific
examples of the ester compound are ethyl acetate, n-
propyl acetate, isopropyl acetate, n-butyl acetate, t-
butyl acetate, methyl propionate, ethyl propionate, n-
propyl propionate, 2-propyl propionate and butyl propio-
nate and the like- As the non-halogen type aromatic
solvent, there are benzene and a benzene substituted
with 1 to 3 substituents selected from the group
consisting of an alkyl group having 1 to 4 carbon atoms
and nitro. Specific examples of the non-halogen type
aromatic solvent include benzene, toluene, xylene,
ethylbenzene, propylbenzenes, butylbenzenes, xylene,
trimethylbenzenes, nitrobenzene and nitrotoluenes.
In the solvent system described above, a
solvent mixture of the non-halogen type aliphatic and
aromatic solvents are advantageously employed for the
reaction above. Representative examples of the
preferred combination are mixtures of the non-halogen
type aliphatic solvent selected from the group consist-
ing of acetonitrile, propionitrile, acetone, methyl
ethyl ketone, methyl isobutyl ketone, ethyl acetate and
isopropyl acetate; and the non-halogen type aromatic
solvent selected from the group consisting of benzene,
toluene, xylene, ethylbenzene, nitrobenzene and nitro-
toluene. A more preferred combination of the two
solvents is acetonitrile selected from the non-halogen
type aliphatic solvent and toluene selected from the
non-halogen type aromatic solvent.
The amount of the solvent is preferably 1 to 7
parts by volume, more preferably 2 to 6 parts by volume
based on 1 part by weight of the compound of formula
(1). Where a mixture of the non-halogen type aliphatic
and aromatic solvents is employed, the total amount may
exceed the upper limit given above. However, it is
preferred to keep the non-halogen type aliphatic solvent
in an amount within the range shown above. Accordingly,
the non-halogen type aliphatic solvent is contained in
the range of preferably 0.1 to 4-fold parts by volume,
more preferably 0.3 to 3-fold parts by volume, based on
1 part by weight of the compound of formula (1).
Where the nitrile type solvent such as aceto-
nitrile is employed, the solvent may be in the range of
approximately 1 to 10-fold parts by volume based on 1
part by weight of the compound of formula (1).
The boron trifluoride dialkyl ether complex
which functions as a catalyst is a complex of boron
trifluoride and a dialkyl ether containing an alkyl
moiety having 1 to 4 carbon atoms. A preferred example
of the dialkyl ether is diethyl ether. For the purpose
for functioning as a catalyst, the complex is used in
the range of generally 1 to 15-fold equivalents,
preferably 1 to 10-fold equivalents, more preferably 1
to 6-fold equivalents to the compound of formula (1).
When an ether is present in the reaction
system, the reaction proceeds advantageously, since
formation of the undesired a-glucoside form can be
in this case, the etner is preferably a mono
or polyether containing 1 to 5 ether groups and 2 to 6
linear or cyclic hydrocarbon groups having 1 to 6 carbon
atoms. More preferably, the mono or polyether is
represented by formula (4):
independently is an alkyl group having i to 4 carbon
atoms; and R4 is a linear or branched alkylene group
having 2 to 4 carbon atoms.
As the linear hydrocarbon groups having 1 to 6
carbon atoms which are located at both sides of the
ether compound molecule, a lower alkyl group such as
methyl, ethyl or propyl is preferred. As the linear
hydrocarbon group having 1 to 6 carbon atoms which is
located in the middle of the ether compound molecule, a
lower alkylene group which may optionally be branched is
preferred. Specific examples of the lower alkylene
group are methylene, ethylene and 1-methylethylene,
Examples of the cyclic hydrocarbon group include phenyl
and phenylene.
Representative examples of the ether compound
of formula (4) include dimethyl ether, diethyl ether and
dipropyl ether of each of ethylene glycol, propylene
glycol, diethylene glycol and triethylene glycol.
Particularly preferred are ethylene glycol dimethyl
ether, ethylene glycol diethyl ether and diethylene
glycol dimethyl ether. Among them, ethylene glycol
dimethyl ether is more preferred as the ether compound.
An mount of the ether compound used may vary depending
upon an amount of the catalyst used and an amount of the
solvent used, but may be generally in the range of 1 to
50%, preferably 10 to 30% based on the solvent.
Each of the compounds of formulas (1) and (2)
is employed for the reaction wherein the compound of
formula (2) is used in an anount ranging from 1 to 5
equivalents, preferably 1.2 to 3 equivalents to the
compound of formula (1).
The reaction is carried out generally at a low
temperature below 10°C, preferably under cooling at 0 to
-30°C, more preferably at -5 to -20°C. The reaction
system is kept in an anhydrous state as possible as one
can. A drying agent such as molecular sieve, etc. may
be employed, if necessary and desired.
Depending upon necessity, the protective
group(s) may be removed from the reaction product of
formula (3) obtained in the reaction described above.
The protective group(s) can be readily removed by
heating the reaction product of formula (3) in methanol
or a solvent mixture containing methanol in the presence
of a conventional deacylation catalyst such as various
acetates or basic substances such as pyridine.
The crude etoposide obtained by the reaction
above may be purified by recrystallization once or twice
from, or by suspension once or twice in a non-halogen
type solvent, e.g., a lower alcohol such as methanol, a
lower ketone such as acetone, a lower carboxylic acid
ester such as ethyl acetate, an ethereal solvent such as
isopropyl ether, a hydrocarbon solvent such as hexane or
a solvent mixture thereof.
According to the process of the present
invention, the halogen compound content in the purified
etoposide can be reduced to 80 ppb or less, preferably
50 ppb or less, more preferably several ppb to about 30
ppb, by means of high performance chromatography.
Etoposide conventional synthesized using a halogen type
solvent unavoidably contains more than hundred and
several tens ppm halogen, compounds such as halogen type
solvents, etc., whereas the halogen compound content of
the etoposide derivative obtained by the process of the
present invention is dramatically reduced sufficiently
to distinguish the same over the prior art etoposide.
Herein the halogen compound content is used to mean that
when two or more halogen compounds are present in the
system, the content is expressed in total of all the
halogen compounds.
The thus purified etoposide substantially
contains neither dimer of the starting 4'-demethyl-4-
As an index for evaluation, the content of these
undesired by-products is, for example, 1% or less,
preferably 0.1% or less.
In the present invention, the compound of
formula (1) and the compound of formula (2) prepared by
any process can be used without any limitation, but it
is preferred to use the compound of formula (1) and the
compound of formula (2) synthesized without using any
halogen type solvent.
Representative examples of the compound of
formula (1) include the following:
Next, the present invention will be described
in more detail with reference to the examples below.
Example 1
While stirring, 1.67 g of Compound (3) of
formula (2) (wherein R2 = COCHCl2), 0.5 ml of aceto-
nitrile and 2.5 ml of toluene were mixed with each
other. The resulting mixture was cooled to -10°C or
below. To the mixture was added 0.55 g of boron
trifluoride diethyl ether complex. Then 1.00 g of
Compound (3) of formula (1) (wherein R1 = rCOCHCl2) was
added to the reaction mixture. While maintaining the
reaction temperature below -10°C, the reaction was
continued for 30 minutes. The reaction was terminated
by adding 0.46 g of pyridine to the system. After 20 ml
of ethyl acetate and 20 ml of water were added to the
reaction mixture, the mixture was stirred followed by
fractionation. By repetition of water washing twice,
the organic layer containing Compound (2) of formula (3)
(wherein R1, R2 = COCHCl2) was obtained. High perform-
ance liquid chromatography analysis reveals that the
rate of the by-produced dimer was 1.31% based on the
objective Compound (2) of formula (3).
Example 2
The same procedures as in Example 1 were car-
ried out except that 0.5 ml of acetone was employed in
place of 0.5 ml of acetonitrile in Example 1. The same
analysis reveals that the rate of the by-produced dimer
was 6.96% based on the objective Compound (2) of formula
(3).
Example 3
The same procedures as in Example 1 were
carried out except that 0.5 ml of ethyl acetate was
employed in place of 0.5 ml of acetonitrile in Example
1. The same analysis reveals that the rate of the by-
produced dimer was 4.13% based on the objective Compound
(2) of formula (3).
Example 4
The same procedures as in Example 1 were
carried out except that 0.5 ml of ethyl acetate was
employed singly in place of 0.5 ml of acetonitrile and
2.5 ml of toluene in Example 1. The same analysis re-
veals that the rate of the by-produced dimer was 11.42%
based on the objective Compound (2) of formula (3).
Comparative Example 1
The same procedures as in Example 1 were
carried; out except that 10 ml (10-fold parts by weight
based on the compound of formula (1)) of acetone alone
was employed singly in place of 0.5 ml of acetonitrile
and 2,5 ml of toluene in Example 1. The same analysis
110.0% based on the objective Compound (2) of formula
(3).
Comparative Example 2
The same procedures as in Example 1 were
carried out except that 10 ml (10-fold parts by weight
based on the compound of formula (1)) of ethyl acetate
alone was employed singly in place of 0.5 ml of aceto-
nitrile and 2.5 ml of toluene in Example 1. The same
analysis reveals that the rate of the by-produced dimer
was 43.99% based on the objective Compound (2) of
formula (3),
Example 5
While stirring, 1.67 g of Compound (3) of
formula (2) (wherein R2 - COCHCl2)/ 0.5 ml of aceto-
nitrile and 2.5 ml of toluene were mixed with each
other. Furthermore, 0.5 ml of ethylene glycol dimethyl
ether was added thereto. The resulting mixture was
cooled to -10°C or below. To the mixture was added 0.83
g of boron trifluoride diethyl ether complex. Then 1.00
g of Compound (3) of formula (1) (wherein R1 = COCHCl2)
was added to the reaction mixture. While maintaining
the reaction temperature below -10°C, the reaction was
continued for 3 hours. The reaction was terminated by
adding 0.7 g of pyridine to the system. After 20 ml of
ethyl acetate and 20 ml of water were added to the
reaction mixture, the mixture was stirred followed by
fractionation. By repetition of water washing twice,
the organic layer containing Compound (2) of formula (3j
(wherein R1, R2 = COCHCl2) was obtained. After 3 ml of
methanol and 1.5 g of ammonium acetate were added to the
organic layer, the mixture was stirred at 40°C for 8
hours to obtain the reaction solution
etoposide. High performance liquid chromatography
analysis of the reaction solution reveals that the
reaction solution contained 1,11 g of etoposide.
Yield, 96.9%.
The a-glucoside was 1.65% (per unit area)
based on the etoposide.
The reaction solution above was heated to
40°C. Water was then added thereto to crystallize
followed by cooling below 25°C, After washing with
water and filtering, crude etoposide was obtained. The
thus obtained etoposide showed a purity of about 97.7%,
whereas the contents of the a-glucoside and the dimer
were both less than 1%, The halogen compound content
was 80 ppb or less.
According to the present invention described
in detail hereinabove, etoposides which are considered
to be useful as carcinostatic medicines can be obtained
in a high purity, without accompanied by undesirable by-
products and without using any harmful halogen type
solvents.
WE CLAIM
WHAT IS CLAIMED IS:
A process for producing an etoposide or
derivative thereof which comprises reacting a protected
4'-demethyl-4-epipodophyllotoxin of formula (1):
wherein R1 is a protective group with a
protected glucose derivative of formula (2);
wherein R2 is a protective group in a non-
halogen type organic solvent, in the presence of a non-
halogen type aliphatic solvent in a 0.1 to 7-fold part
by volume based on 1 part by weight of the etoposide or
derivative thereof of formula (1) and a dehydration
condensing catalyst, to obtain a protected etoposide of
formula (3):
wherein R1, and R2 are as defined above, and optionally
removing the protective group(s) from the protected
etoposide.
2. A process for producing an etoposide or
derivative thereof according to claim 1, wherein an
ether is co-present in the reaction system.
3. A process for producing an etoposide or
derivative thereof according to claim 1, wherein a boron
trifluoride di-lower alkyl ether complex or a tri(C1-C4
alkyl)silyltrifluoromethanesulfonate is employed as a
catalyst.
4. A process for producing an etoposide or
derivative thereof according to claim 2, wherein the
ether is a mono or polyether containing 1 to 5 ether
groups and 2 to 6 linear or cyclic hydrocarbon groups
having 1 to 6 carbon atoms.
5. A process for producing an etoposide or
derivative thereof according to claim 4, wherein the
mono or polyether is represented by formula (4):

wherein n is an integer of 0 to 4; each of R3 and R5
independently is an alkyl group having 1 to 4 carbon
atoms; and R4 is a linear or branched alkylene group
having 2 to 4 carbon atoms.
6. A process for producing an etoposide or
derivative thereof according to claim 1, wherein as the
non-halogen type solvent, acetonitrile alone or a
solvent mixture of acetonitrite and an aromatic solvent
is employed.
7. A process for producing an etoposide or
derivative thereof which comprises reacting a protected
4'-demethyl-4-epipodophyllotoxin of formula (1):
wherein R1 is a protective group, with a
protected glucose derivative of formula (2):
wherein R2 is a protective group, in a
solvent mixture of a non-halogen type aliphatic solvent
and a non-halogen type aromatic solvent in the presence
of a dehydration condensing catalyst, to obtain a
protected etoposide of formula (3):
wherein R1 and R2 are as defined above, and optionally
removing the protective group(s) from the protected
etoposide,
8. A process for producing an etoposide or
derivative thereof according to claim 7, wherein the
non-halogen type aliphatic solvent is selected from the
group consisting of a nitrile compound, a ketone
compound and an ester compound.
9. A process for producing an etoposide or
derivative thereof according to claim 8, wherein used is
as the non-halogen type aliphatic solvent a nitrile
compound of which aliphatic hydrocarbon group is
selected from the group consisting of an alkyl group
having 1 to 3 carbon atoms and an alkylene group having
1 to 3 carbon atoms; a ketone compound of which
aliphatic hydrocarbon groups at the both sides therein
are selected from the group consisting of an alkyl group
having 1 to 5 carbon atoms and an alkylene group having
1 to 5 carbon atoms; and an ester compound which is an
ester of acetic acid or propionic acid and an alcohol
having 1 to 4 carbon atoms.
10. A process for producing an etoposide or
derivative thereof according to claim 8, wherein the
non-halogen type aromatic solvent is benzene or a
benzene substituted with 1 to 3 sub3tituents selected
from the, group consisting of an alkyl group having 1 to
4 carbon atoms and nitro.
11. A process for producing an etoposide or
derivative thereof according to claim 1, wherein an
amount of the non-halogen type aliphatic solvent used is
in the range of 0.1 to 4-fold parts by volume based on 1
part by weight of the compound of formula (1) and the
total amount of the solvent mixture is in the range of 1
to 10-fold parts by volume based on 1 part by weight of
the compound of formula (1).
12. A process for producing an etoposide or
derivative thereof according to claim 11, wherein the
non-halogen type aliphatic solvent is selected from the
group consisting of acetonitrile, propionitrile,
acetone, methyl ethyl ketone, methyl isobutyl ketone,
ethyl acetate and isopropyl acetate; the non-halogen
type aromatic solvent is selected from the group
consisting of benzene, toluene, xylene, ethylbenzene,
nitrobenzene and nitrotoluene; and the dehydration
bondensing catalyst is a boron trifluoride di-alkyl
ether having 1 to 4 carbon atoms and is employed in an
amount ranging from 1 to 15 equivalents to the 4'-
demethyl-4-etoposide of formula (1),
13. A process for producing an etoposide or
derivative thereof according to claim 12 wherein the
non-halogen type aliphatic solvent is a solvent mixture
of acetonitrile and benzene, toluene or xylene, an
amount of acetonitrile used being in the range of 0.3 to
3 parts by volume based on 1 part by weight of the
compound of formula (1), a total amount of the solvent
mixture being in the range of 2 to 6 parts by volume
based on 1 part by weight of the compound of formula
(1), and an amount of the boron trifluoride di-alkyl
ether having 1 to 4 carbon atoms used as a catalyst is
in the range of 1 to 6 equivalents to the compound of
formula (1),
14. A process for producing an etoposide or
derivative thereof which comprises reacting a protected
4'-demethyl-4-epipodophyllotoxin of formula (1) with a
protected glucose derivative of formula (2) in a non-
solvent in tne presence or a
dehydration condensing catalyst, to obtain a protected
etoposide of formula (3) and optionally removing the
protective group(s) from the protected etoposide,
wherein the non-halogen type aliphatic solvent is a
nitrile compound at an amount in the range of 1 to 10-
compound of formula (1).
15. Etoposide, which contains not greater than 50
ppb halogen compounds.
16. Etoposide according to claim 15, which is
substantially free of a dimer of 4'-demethyl-4-
epipodophyllotoxin.
17. Etoposide according to claim 15, which is
substantially free of the a-glucoside form of etoposide.

A protected 4'-demethyl-4-epipodophyllotoxin
is reacted with a protected glucose derivative in 7-fold
parts by volume of the glucose derivative based on 1
part by weight of the protected 4'-demethyl-4-epipodo-
phyllotoxin in a non-halogen type organic solvent to
give an etoposide derivative of formula (3) which is
protected at its functional groups;

wherein each of R1 and R2 each is a protective group for
hydroxy, if necessary, followed by removal of these
protective groups. By use of the non-halogen type
organic solvent in lieu of any harmful halogen type
solvent, formation of undesirable by-products can be
minimized so that the etoposides can be obtained in a
high yield and high purity.

Documents:

2054-cal-1996-abstract.pdf

2054-cal-1996-claims.pdf

2054-cal-1996-correspondence.pdf

2054-cal-1996-description (complete).pdf

2054-cal-1996-examination report.pdf

2054-cal-1996-form 1.pdf

2054-cal-1996-form 18.pdf

2054-cal-1996-form 2.pdf

2054-cal-1996-form 3.pdf

2054-cal-1996-form 5.pdf

2054-cal-1996-pa.pdf

2054-cal-1996-priority document.pdf

2054-cal-1996-specification.pdf

2054-cal-1996-translated copy of priority document.pdf


Patent Number 240475
Indian Patent Application Number 2054/CAL/1996
PG Journal Number 20/2010
Publication Date 14-May-2010
Grant Date 12-May-2010
Date of Filing 28-Nov-1996
Name of Patentee NIPPON KAYAKU KABUSHIKI KAISHA
Applicant Address 11-2, FUJIMI-1-CHOME, CHIYODA-KU, TOKYO
Inventors:
# Inventor's Name Inventor's Address
1 YUKIHIRO FUSAUCHI 260-10, SHIKISCIMACHO, MAEBASHI-SHI
2 HIROSHI YOSHIKAWA 326-2, SHIMOKURISU, FUJIOKA-SHI
PCT International Classification Number A61K 31/00
PCT International Application Number N/A
PCT International Filing date
PCT Conventions:
# PCT Application Number Date of Convention Priority Country
1 07-337720 1995-12-04 Japan
2 07-345114 1995-12-08 Japan