Title of Invention

DEVICE AND PROCESS FOR PRODUCING DC GLOW DISCHARGE

Abstract A device and process for producing a DC glow discharge at low pressure comprising a cylindrical stainless steel closed vacuum chamber (3) provided with means to create a low pressure in the range of 1X10?-5¿ to 5X10?-5¿ mbar preferably 1X10?-5¿ mbar, an open ended hollow cylindrical cathode (2) fixed near the one end of the said cylindrical stainless steel closed vacuum chamber at a predetermined distance from the said closed end of the said vaccum chamber by insulating means, a constricted anode (1) placed axially outside the said cylindrical cathode, a floating D.C. power supply to cylindrical cathode through a current limiting resistor and to the said constricted anode through a rectifier resulting in the emissions of the secondary electrons from the said cylindrical cathode by ion bombardement to travel along the electric field lines which are normal to the said hollow cylindrical cathode; introducing the media for creating the plasma in side the vacuum chamber to a pressure preferably at 10?-2¿ mbar to produce the DC glow inside the chamber followed by switching off the thermionic electron emitter once the plasma is produced. The plasma so generated breaks the atoms and molecules into ions and electrons, individual atoms and small collection of atoms (radicals) resulting in better nitriding, oxidizing, coatings, killing of micro-organisms and synthesizing powders.
Full Text

Documents:

270-mumnp-2003-abstract(granted)-(12-6-2009).pdf

270-MUMNP-2003-CANCELLED PAGES(23-4-2009).pdf

270-MUMNP-2003-CLAIMS(23-4-2009).pdf

270-MUMNP-2003-CLAIMS(AMENDED)-(19-7-2004).pdf

270-MUMNP-2003-CLAIMS(AMENDED)-(23-4-2009).pdf

270-MUMNP-2003-CLAIMS(COMPLETE)-(3-3-2003).pdf

270-mumnp-2003-claims(granted)-(12-6-2009).pdf

270-MUMNP-2003-CORRESPONDENCE(19-7-2004).pdf

270-MUMNP-2003-CORRESPONDENCE(23-4-2009).pdf

270-MUMNP-2003-CORRESPONDENCE(IPO)-(17-7-2009).pdf

270-MUMNP-2003-DESCRIPTION(COMPLETE)-(3-3-2003).pdf

270-mumnp-2003-description(granted)-(12-6-2009).pdf

270-MUMNP-2003-DRAWING(3-3-2003).pdf

270-mumnp-2003-drawing(granted)-(12-6-2009).pdf

270-MUMNP-2003-FORM 1(21-4-2003).pdf

270-MUMNP-2003-FORM 1(3-3-2003).pdf

270-MUMNP-2003-FORM 19(5-1-2004).pdf

270-MUMNP-2003-FORM 2(COMPLETE)-(3-3-2003).pdf

270-mumnp-2003-form 2(granted)-(12-6-2009).pdf

270-MUMNP-2003-FORM 2(TITLE PAGE)-(COMPLETE)-(3-3-2003).pdf

270-mumnp-2003-form 2(title page)-(granted)-(12-6-2009).pdf

270-MUMNP-2003-FORM 26(21-4-2003).pdf

270-MUMNP-2003-FORM 3(3-3-2003).pdf

270-MUMNP-2003-WO INTERNATIONAL PUBLICATION REPORT(3-3-2003).pdf


Patent Number 234726
Indian Patent Application Number 270/MUMNP/2003
PG Journal Number 28/2009
Publication Date 10-Jul-2009
Grant Date 12-Jun-2009
Date of Filing 03-Mar-2003
Name of Patentee INSTITUTE FOR PLASMA RESEARCH
Applicant Address Facilitation Centre for Industrial Plasma Technologies, B-15-17/P, Sector -25, GIDC Electronics Estate, Gandhinagar 382044.
Inventors:
# Inventor's Name Inventor's Address
1 S.K. KARKARI Facilitation Centre For Industrial Plasma Technologies, Institute for Plasma Research, B-15-17/P, SECTOR -25, GIDC Electronics Estate, Gandhinagar 382044.
2 SUBROTO MUKHERJEE Facilitation Centre For Industrial Plasma Technologies, Institute for Plasma Research, B-15-17/P, SECTOR -25, GIDC Electronics Estate, Gandhinagar 382044.
3 PUCADYIL ITTOOP JOHN Facilitation Centre For Industrial Plasma Technologies, Institute for Plasma Research, B-15-17/P, SECTOR -25, GIDC Electronics Estate, Gandhinagar 382044.
4 SUDHIR KUMAR NEMA Facilitation Centre For Industrial Plasma Technologies, Institute for Plasma Research, B-15-17/P, SECTOR -25, GIDC Electronics Estate, Gandhinagar 382044.
PCT International Classification Number H01J37/32
PCT International Application Number PCT/IN00/00077
PCT International Filing date 2000-08-28
PCT Conventions:
# PCT Application Number Date of Convention Priority Country
1 NA